Premium
Evaluation of surface modification processes using a ternary XPS diagram
Author(s) -
Olander Björn,
Albertsson AnnChristine
Publication year - 2002
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.1417
Subject(s) - x ray photoelectron spectroscopy , ternary plot , elemental analysis , ternary operation , diagram , analytical chemistry (journal) , composition (language) , chemistry , materials science , mathematics , inorganic chemistry , physics , computer science , statistics , nuclear magnetic resonance , organic chemistry , linguistics , philosophy , programming language
The use of a ternary XPS diagram to follow surface modification processes involving three elements is described. The elemental composition is represented by a single data point on a plane instead of by two or three elemental ratios or percentages. Vectors are defined between the data points, and simple vector algebra is used to interpret the results. The extent of the surface change is determined by calculating the length of the vector from untreated to a treated composition point, and this leads to a value for the overall change in elemental composition. The direction of the vector indicates how the changes in the individual elemental percentages are related to each other, i.e. what elemental composition the surface is approaching. The ternary XPS diagram is demonstrated and compared with elemental percentages and ratios using XPS data from hydrogen microwave plasma‐treated polydimethylsiloxane. Copyright © 2002 John Wiley & Sons, Ltd.