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Characterization of the boundaries of thin films of TiO 2 by atomic force microscopy and optical methods
Author(s) -
Franta D.,
Ohlídal I.,
Klapetek P.,
Pokorný P.
Publication year - 2002
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.1405
Subject(s) - reflectometry , ellipsometry , surface finish , refractive index , characterization (materials science) , thin film , atomic force microscopy , materials science , optics , surface roughness , silicon , microscopy , analytical chemistry (journal) , chemistry , nanotechnology , optoelectronics , composite material , physics , time domain , chromatography , computer science , computer vision
In this paper slight roughness of the upper boundaries of TiO 2 thin films prepared on substrates formed by single‐crystal silicon is studied. Atomic force microscopy (AFM) and an optical method based on combining variable‐angle spectroscopic ellipsometry and near‐normal spectroscopic reflectometry are used for this purpose. It is shown that the values of the basic statistical quantities characterizing this roughness depend quite strongly on the values of the thicknesses of these films (they increase with increasing thickness). Differences observed between the values of the basic statistical parameters determined by AFM and the optical method are explained. It is also shown that the TiO 2 films exhibit an inhomogeneity represented by a profile of the complex refractive index. Copyright © 2002 John Wiley & Sons, Ltd.