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X‐ray photoelectron spectroscopy studies of CVD diamond films
Author(s) -
Fan Y.,
Fitzgerald A. G.,
John P.,
Troupe C. E,
Wilson J. I. B.
Publication year - 2002
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.1392
Subject(s) - x ray photoelectron spectroscopy , amorphous carbon , diamond , graphite , carbon fibers , carbon film , chemical vapor deposition , amorphous solid , materials science , argon , analytical chemistry (journal) , etching (microfabrication) , chemical engineering , chemistry , nanotechnology , thin film , crystallography , organic chemistry , composite material , composite number , layer (electronics) , engineering
In this research work, a comparative x‐ray photoelectron spectroscopy (XPS) analysis has been performed on three allotropic carbon materials i.e. amorphous carbon films, graphite crystals and chemically vapour deposited (CVD) diamond films. These studies have shown that XPS is one of the most powerful techniques used to distinguish the diamond phase of carbon from the graphite and amorphous carbon components. In these investigations, particular attention has been paid to the effects of the post‐deposition surface treatment on the diamond surfaces and the corresponding spectrum changes. The experimental results confirmed that ion surface cleaning destroys the original carbon atomic bonding configuration and implants argon atoms into the sample surface. The main spectral changes for amorphous carbon, graphite and diamond materials after the ion etching process can be attributed to bonding modification and the existence of argon contamination on the sample surfaces. Copyright © 2002 John Wiley & Sons, Ltd.