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Nano‐oxidation of titanium films with large atomically flat surfaces by means of voltage‐modulated scanning probe microscopy
Author(s) -
Unal Kerem,
Aronsson BjörnOwe,
Mugnier Yannick,
Descouts Pierre
Publication year - 2002
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.1345
Subject(s) - oxide , materials science , surface finish , root mean square , analytical chemistry (journal) , titanium , titanium oxide , voltage , scanning electron microscope , morphology (biology) , nano , nanometre , nanotechnology , surface roughness , optics , chemistry , composite material , electrical engineering , metallurgy , genetics , physics , organic chemistry , chromatography , biology , engineering
Titanium films with large atomically flat surfaces were produced by adapting the template stripping method. The morphology of these surfaces was characterized by contact mode atomic force microscopy and a root‐mean‐square roughness of 0.23 nm at a 1 µm 2 area was obtained. Sample bias voltage modulation was used for nanometer‐scale anodic oxidation of the Ti film. The oxide structures produced showed high reproducibility, with aspect ratios of 0.18 and 0.07 for voltage modulation and static pulse oxidation, respectively. The maximum height of oxide structures was found at ∼20 Hz voltage modulation frequency. Using a negative voltage on the sample in a combination with a Pt/Ir‐coated tip enhanced further the aspect ratio and increased the oxide structure height. The influence of control parameters on the aspect ratio of the oxide structures was studied. Copyright © 2002 John Wiley & Sons, Ltd.