Quantification of oxide film thickness at the surface of aluminium using XPS | Zendy

Alexander M. R. | Zendy; Thompson G. E. | Zendy; Zhou X. | Zendy; Beamson G. | Zendy; Fairley N. | Zendy

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Quantification of oxide film thickness at the surface of aluminium using XPS

Author(s) -

Alexander M. R.,

Thompson G. E.,

Zhou X.,

Beamson G.,

Fairley N.

Publication year - 2002

Publication title -

surface and interface analysis

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.52

H-Index - 90

eISSN - 1096-9918

pISSN - 0142-2421

DOI - 10.1002/sia.1344

Subject(s) - x ray photoelectron spectroscopy , aluminium , oxide , metal , analytical chemistry (journal) , hydroxide , aluminum oxide , aluminium oxide , materials science , layer (electronics) , chemistry , inorganic chemistry , metallurgy , composite material , chemical engineering , chromatography , engineering

Oxide films grown anodically at the surface of superpure aluminium are used as standards to assess the accuracy of the thickness ( d XPS ) determined using the Beer–Lambert treatment of the Al 2p metal and oxide peak intensities. For the fitting conditions employed, the value of d XPS is found to be very close to the true film thickness for films <10 nm thick, beyond which imprecise values are obtained. A surface layer of hydration is identified from the curve fitting of the O 1s core level, which would qualitatively account for the slight underestimate of film thickness provided by the expression for d XPS . The validity of the Al 2p fit may be determined through this correlation of thickness but requires first a quantitative assessment of the thickness and composition of the hydroxide‐rich layer. Copyright © 2002 John Wiley & Sons, Ltd.

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