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Angle‐resolved XPS analysis of molybdenum and tungsten in passive films on stainless steel PVD alloys
Author(s) -
Olsson C.O. A.,
Mathieu H.J.,
Landolt D.
Publication year - 2002
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.1268
Subject(s) - molybdenum , x ray photoelectron spectroscopy , tungsten , tungsten compounds , hydroxide , materials science , solubility , oxide , chemistry , inorganic chemistry , metallurgy , chemical engineering , engineering
Passive films on physical vapour deposited alloys, based on 304L with additions of 20 at.% of molybdenum and tungsten, were studied with angle‐resolved XPS. The samples were anodically polarized in a sulphate solution to potentials in the low and high passive region, respectively. In the low passive region, the Mo spectrum contained a strong contribution of Mo(IV) hydroxide. In the high passive region, higher fractions of hexavalent species were found; W(VI) gave a stronger contribution than Mo(VI), as can be understood by the lower solubility of the W(VI) salts. Contributions to tetravalent molybdenum were found to consist of oxide (MoO 2 ) as well as oxyhydroxide compounds. For tungsten, the dominating tetravalent contribution was WO 2 . Copyright © 2002 John Wiley & Sons, Ltd.