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Accurate RBS measurement of ion implant doses in silicon
Author(s) -
Boudreault G.,
Jeynes C.,
Wendler E.,
Nejim A.,
Webb R. P.,
Wätjen U.
Publication year - 2002
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.1235
Subject(s) - reproducibility , analytical chemistry (journal) , rutherford backscattering spectrometry , channelling , detector , certified reference materials , ion , calibration , materials science , computational physics , chemistry , optics , physics , statistics , mathematics , detection limit , organic chemistry , chromatography
We demonstrate very accurate ion implant dose measurements using Rutherford backscattering spectrometry (RBS) traceable to a certified reference material from IRMM, Geel and the Bundesanstalt für Materialforschung (BAM), Berlin. The measurements have an absolute accuracy of better than 1.4% and a precision of better than 1.25%. The certified standard sample is compared directly with recent absolute determinations of the energy loss of He in Si, and also with a sample calibrated against the Harwell Bi standard. We determine the dose in a series of three In implants and six As implants of various doses and energies. Some of the samples were amorphized to eliminate channelling effects. A double detector geometry was used, giving pairs of spectra with a common incident charge but where the solid angle and the electronic gain were determined for each detector channel independently. The statistical uncertainty is reduced to <1%. The non‐linear pile‐up background is determined carefully. The errors are determined critically. The experiments were carried out at different dates and different places, so time and space reproducibility of the results is confirmed. The IBA DataFurnace is used for analysis of the certified standard reference material and compared with a transparent manual data reduction method: the use of this code for routine data analysis at the highest accuracy is validated. Copyright © 2002 John Wiley & Sons, Ltd.