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Ellipsometric approach to the monitoring of tip–surface proximity in NFO
Author(s) -
Bortchagovsky Eugene G.
Publication year - 2002
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.1166
Subject(s) - ellipsometry , analyser , optics , interferometry , polarization (electrochemistry) , surface (topology) , physics , materials science , chemistry , nanotechnology , thin film , geometry , mathematics
This work continues the development of the proposed early ellipsometric approach to near‐field microscopy. It is devoted now to the demonstration of the possibility of monitoring the tip–surface distance at the tip's approach to a surface by analysis of the polarization state of scattered light. It is shown that such analysis distinguishes between different interferometric periods recorded at the approaching tip, so that it is possible to control the distance without restriction in one period. Such a method may be realized using a standard modern ellipsometer with a rotating analyser. Copyright © 2002 John Wiley & Sons, Ltd.