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Direct imaging of plasma‐polymerized chemical micropatterns
Author(s) -
Bullett N. A.,
Short R. D.,
O'Leary T.,
Beck A. J.,
Douglas C. W. I.,
CambrayDeakin M.,
Fletcher I. W.,
Roberts A.,
Blomfield C.
Publication year - 2001
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.1146
Subject(s) - x ray photoelectron spectroscopy , secondary ion mass spectrometry , transmission electron microscopy , plasma polymerization , polymerization , chemistry , mass spectrometry , copper , carboxylic acid , analytical chemistry (journal) , plasma , fluorine , time of flight , chemical engineering , polymer chemistry , materials science , nanotechnology , organic chemistry , polymer , chromatography , physics , quantum mechanics , engineering
Both XPS and time‐of‐flight secondary ion mass spectrometry (ToF‐SIMS) imaging have been used to characterize chemically micropatterned surfaces formed by plasma polymerization, using a copper transmission electron microscope grid as a mask. Micropatterns of spatially distinct regions of fluorine, carboxylic acid and hydrocarbon functionalities have been imaged by ToF‐SIMS, whereas imaging XPS has demonstrated the ability to produce patterns of nitrogen‐containing functionalities. Features as small as 50μm bars and 75μm ‘islands’ have been imaged. The utility of these chemically defined patterns has been demonstrated by the spatial binding of protein and by the attachment of cerebellar granule neurons. Copyright © 2001 John Wiley & Sons, Ltd.