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SAXS analysis of interface in organo‐modified mesoporous silica
Author(s) -
Li Zhi Hong,
Gong Yan Jun,
Wu Dong,
Sun Yu Han,
Wang Jun,
Liu Yi,
Dong Bao Zhong
Publication year - 2001
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.1118
Subject(s) - small angle x ray scattering , magic angle spinning , mesoporous silica , scattering , fourier transform infrared spectroscopy , mesoporous material , materials science , synchrotron radiation , analytical chemistry (journal) , chemistry , crystallography , nuclear magnetic resonance spectroscopy , chemical engineering , optics , organic chemistry , physics , catalysis , engineering
A small‐angle x‐ray scattering (SAXS) technique using synchrotron radiation as the x‐ray source has been employed to characterize the microstructure of mesoporous silica prepared by one‐pot template‐directed synthesis methodology. The scattering of pure silica agreed with Porod's law. The scattering of organo‐modified mesoporous silica showed a negative deviation from Porod's law, suggesting that an interfacial layer exists between the pores and silica matrix. It was the organic groups comprising the interface, as shown by 29 Si cross‐polarization magic‐angle spinning nuclear magnetic resonance imaging ( 29 Si CP MAS/NMR) and Fourier transform infrared spectroscopy (FTIR), that caused this negative deviation of SAXS intensity from Porod's law, and the average thickness of the interfacial layer could be deduced from this negative deviation. Copyright © 2001 John Wiley & Sons, Ltd.