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X‐ray photoelectron spectroscopy study of carbon nitride coatings deposited by IR laser ablation in a remote nitrogen plasma atmosphere
Author(s) -
Jama C.,
Al khawwam A.,
Loir AS.,
Goudmand P.,
Dessaux O.,
Gengembre L.,
Grimblot J.
Publication year - 2001
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.1110
Subject(s) - x ray photoelectron spectroscopy , analytical chemistry (journal) , carbon nitride , laser ablation , nitrogen , nitride , carbon fibers , materials science , chemistry , laser , nanotechnology , nuclear magnetic resonance , photocatalysis , biochemistry , physics , organic chemistry , chromatography , layer (electronics) , composite number , optics , composite material , catalysis
The reactive pulsed laser deposition technique was used to deposit carbon nitride (CN x ) coatings on a silicon substrate. In this process, an infrared transversely excited atmospheric pressure CO 2 laser ablation of a graphite target in a remote nitrogen plasma afterglow was used to provide simultaneously both carbon and nitrogen‐containing species. Evidence of different CN bonding configurations has been observed in the deposited coatings. For nitrogen pressures ( P N 2) of ≥700 Pa there is an increase in the contribution of sp 2 carbon atoms that is associated with graphitization of the CN x coatings. For P N 2increasing from zero to 100 Pa, the comparison between XPS core‐level and valence band spectra of the CN x coatings shows good correlation between the p‐derived states (C 2p electrons) of C–C π bonds in the valence band and the sp 2 carbon atom concentration deduced from the C 1s spectra. The progressive positive contribution of nitrogen lone pair electrons to the valence band is consistent with the increase of the N–C sp 3 contribution with P N 2. The decrease in the sp 2 carbon atom contribution is associated with the increase of the nitrogen concentration in the coatings. Copyright © 2001 John Wiley & Sons, Ltd.