Premium
Quantitative surface characterization of poly(styrene)/poly(4‐vinyl phenol) random and block copolymers by ToF‐SIMS and XPS
Author(s) -
Liu Shiyong,
Weng LuTao,
Chan ChiMing,
Li Lin,
Ho Nick K.,
Jiang Ming
Publication year - 2001
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.1105
Subject(s) - copolymer , x ray photoelectron spectroscopy , styrene , polystyrene , polymer chemistry , secondary ion mass spectrometry , calibration curve , characterization (materials science) , chemistry , analytical chemistry (journal) , materials science , mass spectrometry , polymer , chemical engineering , organic chemistry , nanotechnology , chromatography , detection limit , engineering
A series of spin‐cast films of poly(styrene‐ co ‐4‐vinyl phenol) (STVPh) random copolymers and polystyrene‐ b ‐poly(4‐vinyl phenol) (PS‐ b ‐PVPh), which have the same building units but different chain architecture, were analysed by x‐ray photoelectron spectroscopy (XPS) and time‐of‐flight secondary ion mass spectrometry (ToF‐SIMS). The XPS results show that there was no surface segregation of any component for the STVPh random copolymers. The calibration curves for ToF‐SIMS intensity as a function of the VPh content were obtained for the STVPh random copolymers. These calibration curves were used to determine the surface chemical composition of the block copolymers. The ToF‐SIMS results agreed well with the angle‐dependent XPS results. Time‐of‐flight SIMS also was shown to be able to distinguish PS‐ b ‐PVPh from the STVPh random copolymers by the absence of the peaks corresponding to the St–VPh or St–St–VPh sequence structures. Copyright © 2001 John Wiley & Sons, Ltd.