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Surface modification of the Ti–Al alloys at 1000–1200 K
Author(s) -
Thongtem Somchai,
Thongtem Titipun,
McNallan Michael
Publication year - 2001
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.1040
Subject(s) - nitriding , nitride , materials science , aluminium , diffraction , hardness , atmospheric pressure , arrhenius equation , metallurgy , nitrogen , indentation hardness , analytical chemistry (journal) , activation energy , microstructure , layer (electronics) , chemistry , composite material , physics , optics , chromatography , organic chemistry , meteorology
Alloys of Ti–40wt.%Al, Ti–43wt.%Al, Ti–48wt.%Al, Ti–47wt.%Al–2wt.%Nb–2wt.%Cr and Ti–47wt.%Al–2wt.%Nb–2wt.%Mn–0.8wt.%TiB 2 were nitrided in ammonia at atmospheric pressure and at 1000–1200 K for 3.6 × 10 5 s. The hardness and thickness of the nitride layers on the alloys were measured. It was found that the hardness values increased with increasing nitridation temperature and aluminum concentration in the alloys. The depth of nitridation and the mass gain of the nitrided specimens could be represented by an Arrhenius‐type equation and the activation energies were calculated. The x‐ray diffraction results were explained and are in agreement with the improvement of the hardness. Copyright © 2001 John Wiley & Sons, Ltd.