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Partial reduction of Si(IV) in SiO 2 thin film by deposited metal particles: an XPS study
Author(s) -
Komiyama Masaharu,
Shimaguchi Takemi
Publication year - 2001
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.1034
Subject(s) - x ray photoelectron spectroscopy , metal , deposition (geology) , materials science , thin film , chemistry , analytical chemistry (journal) , chemical engineering , metallurgy , nanotechnology , environmental chemistry , paleontology , sediment , engineering , biology
Metal–support interactions in systems of dispersed metals supported on thin‐film silica surfaces were examined by x‐ray photoelectron spectroscopy. Four metal–silica systems—Pt–, Pd–, Ag–and Au–SiO 2 —all indicated the formation of partially reduced Si(IV) species by the metal deposition. The extent of the reduction varied little with the kind or amount of deposited metal species. On the other hand, the amount of this newly formed Si(IV–δ) indicated a strong metal species dependence. Copyright © 2001 John Wiley & Sons, Ltd.