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Nanoalignment mask fabricated directly on Si by AFM
Author(s) -
Huang WenHao,
Dang Xueming,
Hu Qiao,
Xia Yi,
Telllo Marta,
Calleja Montserrat,
García Ricardo,
GómezRodńguez J. M.,
Baro A.
Publication year - 2001
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.1023
Subject(s) - microelectronics , atomic force microscopy , nanometre , nanotechnology , materials science , sensitivity (control systems) , optoelectronics , engineering physics , engineering , electronic engineering , composite material
The alignment mask with submicrometre and nanometre sensitivity is very important and useful in the microelectronics industry and for nanoscience and technology in the near future. Here we report for the first time a nanoalignment mask that has been fabricated directly on Si by atomic force microscopy. Copyright © 2001 John Wiley & Sons, Ltd.