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Paper No 16.2: New Process for Patterned Retarder Fabrication
Author(s) -
Trofimova Alexandra,
Mahilny Uladzimir,
Stankevich Alexander,
Muravsky Alexander,
Murauski Anatoli
Publication year - 2013
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1002/sdtp.75
Subject(s) - rubbing , retarder , fabrication , materials science , mesogen , process (computing) , nanotechnology , optoelectronics , liquid crystal , composite material , computer science , liquid crystalline , medicine , alternative medicine , pathology , operating system
We report novel technique to fabricate patterned retarder films on the basis of reactive mesogen materials (RMM). The comparison of RMM‐patterned retarders fabricated via our innovative high‐anchoring‐patterned rubbing and standard contactless photoalignment techniques of the same B15 alignment material developed by us is presented.