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P‐13.7: Tuning the Inorganic‐Organic Property of Silicon Nitride for the Encapsulation of OLED devices
Author(s) -
Miao Yang,
Du Yanying,
Qian Jiajia,
Li Jinchuan,
Cao Weiran
Publication year - 2021
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1002/sdtp.15364
Subject(s) - oled , buffer (optical fiber) , materials science , chemical vapor deposition , encapsulation (networking) , fabrication , plasma enhanced chemical vapor deposition , optoelectronics , layer (electronics) , chemical engineering , nanotechnology , computer science , medicine , telecommunications , computer network , alternative medicine , pathology , engineering
Employing the inorganic‐organic multi‐layer thin film encapsulation (TFE) was an efficient way to retard the water permeation to OLEDs and enhance the life time of OLED devices. In this study, a novel SiNy film with kind of organic property was developed by adjusting the deposition condition of plasma‐enhanced chemical vapor deposition (PECVD), and the SiNy was used as the buffer layer for the fabrication of multi‐layer TFE. Compared to the normally inorganic SiNx, the buffer SiNy possessed more chemical bonds in chain, which endowed the SiNy with low stress and coverage ability. Subsequently, the buffer SiNy was employed in the encapsulation of OLEDs, and the RA test showed the SiNy buffer could efficiently prolong the lifetime of OLEDs.