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P‐6.10: Review of Applications of Environmental Assessment on Defect Defense in FPD Industry
Author(s) -
Yang Cheng Yu,
Yang Jin Wen,
Gao Yan Nan
Publication year - 2021
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1002/sdtp.15311
Subject(s) - cleanroom , work (physics) , factory (object oriented programming) , product (mathematics) , engineering , semiconductor industry , new product development , manufacturing engineering , process engineering , computer science , mechanical engineering , nanotechnology , business , materials science , geometry , mathematics , marketing , programming language
As the feature of product size of FPD industry, the dimension of product in processing is larger relative to semiconductor industry, especially for the coming of new generation. This characterizes large chemical usage (potential chemical leakage), factory footprint (high recirculation air flow volume and complex air exchange possibility), and transportation vehicle (high air resistance and unintentional air transfer) and makes the AMC issue on product devices largely different from that of semiconductor industry. Based on past more than 15 years of work experience accumulation, an aided way integrated with air sampling and database analysis, CFD (computational fluid dynamics, tool layout and process flow, and cleanroom circulation investigation as a name “environmental assessment” has gradually gained recognition and acceptance for defect defense in FPD industry applications. This review introduces how the environment is systematically assessed and share how these four approaches work on assessment by past work defense.