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P‐4.7: Fundamental Research on High Resolution Full Color Micro‐LED Display with Quantum Dot Color Conversion by Lithography
Author(s) -
Xin Juan,
Song Qi,
Ma Jingrui,
Wu Zhenghui,
Liu Pai,
Sun Xiao Wei
Publication year - 2021
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1002/sdtp.15280
Subject(s) - backlight , gamut , color gel , quantum dot , materials science , optoelectronics , color filter array , photolithography , lithography , optics , leakage (economics) , color rendering index , layer (electronics) , light emitting diode , liquid crystal display , nanotechnology , physics , economics , thin film transistor , macroeconomics
This study is based on the blue micro‐LED backlight and photoluminescent quantum dot color conversion layer (QDCC) as the light source of the full color micro‐LED display structure. In order to obtain a high resolution Micro‐LED display panel with color convertion, we firstly studied the the influence of black matrix (BM) layer and color filter (CF) layer. The CF layer is used to reduce the blue light leakage. It should be noted that thickness and absorption spectrum of the CF layer will have a significant impact on the color gamut. The BM layer is to prevent backlight leakage from the sidewalls and crosstalk. The successfully prepared of the 5µm pattern has greatly promoted our subsequent process, and the photolithography of quantum dot layer will be further studied in our subsequent work.

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