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55.1: Invited Paper: FMM‐free OLED Manufacturing Enabled by Photolithographic Patterning Processes
Author(s) -
Ke Tung-Huei,
Sandeheng Calvin Mona,
Alvarez Gema Molina,
Vandenplas Erwin,
Ciarnain Rossa Mac,
Malinowski Pawel E.,
Genoe Jan,
Heremans Paul
Publication year - 2021
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1002/sdtp.15238
Subject(s) - oled , photolithography , photoresist , materials science , fabrication , optoelectronics , wafer , nanotechnology , layer (electronics) , medicine , alternative medicine , pathology
Resolution and brightness are the essential figure‐of‐merits for the microdisplay development needed for AR and VR applications. In this presentation, we show our technology development toward high‐resolution FMM‐free direct R‐G‐B OLED microdisplays. We show the schematic fabrication setup and integration route to fabricate red, green, and blue OLED pixels side‐by‐side by the OLED photolithographic patterning processes. We demonstrate a 1µm line and space feature with the photoresist and transfer the pattern to an OLED stack. With the high resolution of photoresist, high aperture ratio, and high‐resolution multicolor OLED pixel arrays are demonstrated. We also investigate the possible OLED degradations induced in the photolithography process. With the innovations in the process steps, OLED stacks, process environments, and photoresists, we demonstrate a breakthrough in the reliability of photolithography patterned OLED.