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54.1: Invited Paper: High‐Transmission and High‐Contrast‐Ratio AIFF MVA LCDs without Rubbing, Protrusion, ITO Slit and Photoalignment Process
Author(s) -
Ong Hiap L.,
Chou Juishu,
Zhao Yuese,
Zhu Zeli
Publication year - 2021
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1002/sdtp.15233
Subject(s) - liquid crystal display , rubbing , materials science , process (computing) , power consumption , transmission gate , transmission (telecommunications) , fabrication , contrast (vision) , contrast ratio , optoelectronics , pixel , optics , thin film transistor , power (physics) , computer science , electrical engineering , engineering , transistor , telecommunications , nanotechnology , physics , voltage , layer (electronics) , alternative medicine , pathology , composite material , operating system , quantum mechanics , medicine
High‐transmission, high contrast ratio and low‐power‐consumption amplified intrinsic fringe field (AIFF) multi‐domain vertical alignment (MVA) LCD's are developed for microdisplay for augmented reality, portable smart phones, GPS, tablet, and LC TV display applications. The AIFF MVA design eliminates all protrusions and ITO slits in TFT and CF.substrates, resulting in high transmission and high yield. The no‐pretilt fabrication process is low cost, does not require PI rubbing and special photoalignment process, and uses standard IC, LC, and PI materials. AIFF MVA is the only LCD mode without edge disclinations. It is compatible with the RGBW square pixel designs for low power consumption LCD applications.