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41.2: Invited Paper: Crystal Control of Amorphous Silicon by Laser Annealing Using Blue Laser Diode
Author(s) -
Yang Y,
Kosugi J,
Kinoshita M,
Toriyama S,
Saito K,
Sawai T,
Sasaki N,
Gotoh J,
Sugimoto S
Publication year - 2021
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1002/sdtp.15178
Subject(s) - materials science , silicon , optoelectronics , amorphous silicon , diode , laser , hybrid silicon laser , crystal (programming language) , annealing (glass) , monocrystalline silicon , optics , crystalline silicon , computer science , composite material , physics , programming language
We will proposed new silicon crystallization annealing technology using blue laser diode, proprietary optic fiber transfer and optic projection system. The new optical system produces rectangle top‐hat‐shaped irradiation onto substrate surface. By the new system, the heating and cooling can be controlled, obtained silicon crystal can be controlled from poly silicon, lateral silicon and single crystal. The large‐grain‐size lateral silicon crystal and single crystal silicon have great potential in displays and sensor devices because their higher carrier mobility and higher reliability.