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32.3: Invited Paper: The Development Trend of High‐end NB Technology
Author(s) -
He Jian
Publication year - 2021
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1002/sdtp.15149
Subject(s) - thin film transistor , amorphous solid , frame (networking) , product (mathematics) , electrical engineering , power consumption , technology development , brightness , materials science , engineering physics , optoelectronics , power (physics) , manufacturing engineering , computer science , engineering , telecommunications , nanotechnology , physics , optics , chemistry , crystallography , geometry , mathematics , layer (electronics) , quantum mechanics
By comparing the performance indicators of the three different types of TFT‐LCD process technology, low‐temperature polysilicon (LTPS), oxide and amorphous silicon (a‐Si) products, it is found that LTPS, due to its high electron mobility, can meet the future demand for high‐end notebook products, covering the product types of long‐lasting, light and thin business notebooks, high‐brightness and wide frame rate (WFR) gaming notebooks, in which LTPS products have shown obvious advantages. Through the analysis of the existing LTPS technology, the development trend of high‐end notebooks in the next few years is given, including LCM border, power consumption, WFR and in‐cell touch.