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63‐2: Student Paper: Thin‐film Compatible Process High Resolution Patterning of Quantum Dots Light‐emitting Diodes
Author(s) -
Ma Jingrui,
Jia Siqi,
Tang Haodong,
Qu Xiangwei,
Xu Bing,
Wu Zhenghui,
Liu Pai,
Tang Jing,
Wang Kai,
Sun Xiao Wei
Publication year - 2021
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1002/sdtp.14838
Subject(s) - quantum dot , optoelectronics , materials science , diode , light emitting diode , thin film , pixel , layer (electronics) , semiconductor , process (computing) , high resolution , nanotechnology , computer science , optics , physics , remote sensing , geology , operating system
Reliable quantum dots (QD) patterning techniques are essential for QD industrialization in the high‐resolution display application field. In this work, the patterned quantum dots light‐emitting diodes (QLED) are fabricated by a thin film compatible process. SiO 2 is introduced as an isolation layer and the pixel size can shrink to 5 µm with good pattern uniformity. This method shows a promising way to integrate the solution‐processed QLED with the traditional semiconductor thin‐film process.