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24‐4: Research on Water Vapor Penetration of OLED Encapsulation
Author(s) -
Sun Tao,
Qin Chengjie,
Wang Tao,
Zhang Ziyu,
Wang Youwei,
Zhang Song,
Liu Zheng,
Shi Shiming,
Wang Dawei
Publication year - 2021
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1002/sdtp.14675
Subject(s) - penetration (warfare) , water vapor , materials science , x ray photoelectron spectroscopy , vapor pressure , oled , penetration rate , chemical engineering , analytical chemistry (journal) , composite material , chemistry , environmental chemistry , layer (electronics) , organic chemistry , petroleum engineering , operations research , engineering
This paper studied the characteristics of OLED encapsulation film, the test method of water vapor penetration and improving the ability of water vapor barrier. It was found that the group changes after hygroscopic, transferred to Si‐O bond. Based on this mechanism, the test method of water vapor penetration was studied. The average water vapor penetration rate P of film A and film B was about 0.14nm/h and 34nm/h respectively at 85 °C /85%RH environment by TOF‐SIMS and XPS test. At the same time, the permeability lag phenomenon was found. The enhancement effect of inter‐layer structure on water vapor barrier ability was further studied.