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12‐1: Controlling the Pixel Colors of Quantum Dot Thin Films by Patterning the Substrates
Author(s) -
Wu Zhenghui,
Wang Weigao,
Ma Jingrui,
Liu Pai,
Sun Xiao Wei
Publication year - 2021
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1002/sdtp.14631
Subject(s) - photolithography , materials science , thin film , optoelectronics , quantum dot , resistive touchscreen , nanotechnology , electrode , inkwell , computer science , chemistry , composite material , computer vision
The common methods to achieve high resolution of patterned QD thin films are photolithography of QD thin films and ink‐jet printing of QD thin films. To avoid damages on QDs caused by photolithography and further increase the resolution of the patterned QD, a new method, i.e. selective extraction of lightemission by patterning the bottom electrode instead, was developed in this work. The theory of this method is based on optical interference. Patterning the ITO substrates offers more flexibility and higher resolution, since ITO is more robust and resistive to damages related to photolithography.