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9‐3: Performance of New Gen. 6 Exposure Tools for 1.2 μm Resolution
Author(s) -
Yabu Nobuhiko,
Hakko Manabu,
Okubo Toru,
Oyanagi, Takeo,
Ando Miwako,
Terashi Takaaki,
Izumi Nozomu,
Osaki Yoshinori
Publication year - 2021
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1002/sdtp.14620
Subject(s) - resolution (logic) , production (economics) , high resolution , computer science , materials science , remote sensing , geology , artificial intelligence , economics , macroeconomics
We have developed new Gen. 6 exposure tools “MPAsp‐E903T” for 1.2 μm L&S and 1.8 μm hole patterning. Results of various performance tests show that the new tool meets all requirements for stable mass production of high quality display panels. Even higher resolution can be obtained with new techniques.