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P‐61: Research on the Key Factors Affecting the LC Margin Lower Limit of LCD
Author(s) -
Liu Le,
Xiao Lang,
Zhang Pang-Ling,
Yi Cen,
Hu Qian-Shuang,
Zhao Bin
Publication year - 2020
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1002/sdtp.14191
Subject(s) - margin (machine learning) , limit (mathematics) , key (lock) , finite element method , affect (linguistics) , liquid crystal display , computer science , materials science , mathematics , engineering , structural engineering , psychology , optoelectronics , mathematical analysis , machine learning , computer security , communication
In this paper, the key factors to affect the lower limit of LC margin are investigated by finite element simulation and design of experiment (DOE). Moreover, the compression characteristic of photo spacer (PS) is studied deeply. The research provides a reference for the estimation and design of LC margin.