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P‐57: Preparation of Patternable High Resolution and High Refractive Index Materials for AR/VR
Author(s) -
Hikida Jiro,
Chisaka Hiroki,
Ijima Yoichiro,
Liao Yuehchun,
Konno Kenri,
Hirano Isao,
Misumi Kouichi,
Shiota Dai,
Ohmori Katsumi
Publication year - 2020
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1002/sdtp.14187
Subject(s) - photolithography , refractive index , materials science , high resolution , high refractive index polymer , transparency (behavior) , nanotechnology , inkwell , optoelectronics , computer science , composite material , remote sensing , computer security , geology
The patternable materials have been improved to be high transparency, high resolution, and adaptable for patterning with photolithography, ink‐jet print and imprint. Moreover, combination of high refractive index materials and the patternable technologies led to wider applications for next generation of display industry, such as AR/VR and smart glasses.