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P‐52: A Novel Six‐Mask Low‐Temperature Polycrystalline Silicon Architecture for TFT‐LCD Application
Author(s) -
Luo Chengzhi,
He Peng,
Xu Yong,
Song Dewei,
Liu Guanghui,
Tang Fuxiong,
Ai Fei
Publication year - 2020
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1002/sdtp.14183
Subject(s) - thin film transistor , liquid crystal display , materials science , optoelectronics , polycrystalline silicon , oxide thin film transistor , layer (electronics) , silicon , nanotechnology
A novel six‐mask LTPS TFT architecture is fabricated and used in TFT‐LCD. The light shielding layer and organic layer are removed. Furthermore, the pixel indium tin oxide and source drain patterns are developed in one halftone mask. To solve the issue of high photo leakage current, we have investigated the generation mechanism of I photo and established guidelines for reducing it. The optical and electrical characteristics of the six‐mask TFT‐LCD are comparable to those of conventional TFT‐LCD.