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61‐2: 2‐inch, 2,000‐ppi Silicon Nitride Mask for Patterning Ultra‐High‐Resolution OLED Displays
Author(s) -
Jiang Yibin,
Tam Bryan Siu Ting,
Dong ShouCheng,
Tang Ching W.
Publication year - 2020
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1002/sdtp.14018
Subject(s) - shadow mask , silicon nitride , materials science , optoelectronics , fabrication , nitride , silicon , layer (electronics) , shadow (psychology) , nanotechnology , optics , medicine , physics , alternative medicine , pathology , psychology , psychotherapist
We developed a 2‐inch, 2000 ppi shadow mask based on micronthin, free‐standing silicon nitride (SiN x ) membrane for patterning OLED displays. Its layer composition and fabrication process were optimized to yield an ultra‐flat, self‐tensioned silicon nitride mask (SNM) that can achieve a submicron shadow distance limited only by the thickness of the membrane in line‐of‐sight vacuum depositions.