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43‐3: Ab‐initio Simulation of Doped Injection Layers.
Author(s) -
Symalla Franz,
Fediai Artem,
Armleder Jonas,
Kaiser Simon,
Strunk Timo,
Neumann Tobias,
Wenzel Wolfgang
Publication year - 2020
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1002/sdtp.13946
Subject(s) - doping , dopant , materials science , ab initio , optoelectronics , chemical physics , computer science , chemistry , organic chemistry
Optimization of doped injection layers in state‐of‐the‐art OLEDs via experimental trial&error by tuning host‐dopant combinations/concentrations is time‐consuming and costly. We present a multiscale‐simulation approach to investigate doping on microscopic level, i.e. the impact of microscopic properties on doping performance, and illustrate how to apply simulations towards materials design.