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15‐2: Gen 10 Excimer Laser Annealing System
Author(s) -
Fuji Takahiro,
Yamaguchi Yoshihiro,
Suzuki Yuki,
Mikami Takahiro,
Tanigawa Sadao
Publication year - 2020
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1002/sdtp.13836
Subject(s) - excimer laser , annealing (glass) , laser , materials science , excimer , optoelectronics , nanotechnology , optics , composite material , physics
We have developed Excimer Laser Annealing system for Gen. 10 glass substrates for mass production which appropriates high resolution and large sized displays. Performance of the ELA system meets sufficiently compared to conventional ELA system. We will describe some key features and performance evaluations of the advanced ELA system.