Premium
15‐1: Invited Paper: Manufacturing Technology of LTPO TFT
Author(s) -
Chung Ui-Jin,
Choi Seung-Chan,
Noh So young,
Kim Ki-Tae,
Moon Kyeong-Ju,
Kim Jeong-Hyun,
Park Kwon-Shik,
Choi Hyun-Chul,
Kang In-Byeong
Publication year - 2020
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1002/sdtp.13835
Subject(s) - thin film transistor , amoled , materials science , reliability (semiconductor) , stack (abstract data type) , optoelectronics , oxide thin film transistor , transistor , degradation (telecommunications) , electrical engineering , engineering , computer science , layer (electronics) , nanotechnology , active matrix , physics , power (physics) , quantum mechanics , voltage , programming language
Low‐Temperature Poly‐Si and Oxide (LTPO) thin‐film transistors (TFTs) have been successfully manufactured and the AMOLED panels with LTPO TFTs are adapted to Apple Watch. The manufacturing technology of LTPO TFT such as stack‐up structure, device characteristics, panel image quality with LRR driving, and degradation of reliability in oxide TFT is explained and discussed.