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P‐11.11: The Study of Solving the Film Peeling in the Application of the LCD Technology
Author(s) -
Li Ting,
Tan Li,
Chen Luqin,
Li Xiaohu,
Jiang Wei
Publication year - 2019
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1002/sdtp.13698
Subject(s) - annealing (glass) , materials science , pixel , liquid crystal display , stress (linguistics) , computer science , optoelectronics , composite material , computer vision , linguistics , philosophy
An effective way to solve film peeling has been proposed in this paper. The stress change of ITO film surface structure caused by helium treatment has been discussed. Annealing of pixel ITO after the date process and changing the ratio of SiH4:NH3 flow rate can improve the interface stress and peeling. When the ratio of SiH4:NH3 is 0.188, the samples without spot mura has good performance.