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P‐6.15: The Effects of N 2 O and NH 3 Plasma Treatment on the Device Performance of Solution‐Processed Thin Film Transistors
Author(s) -
Li Xuyang,
Cheng Jin,
Yu Zhig
Publication year - 2019
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1002/sdtp.13651
Subject(s) - beijing , photonics , chinese academy of sciences , china , engineering physics , library science , computer science , physics , optoelectronics , political science , law
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