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P‐6.10: Study on the mechanism and method of improving around mura
Author(s) -
Chi Baolin,
Zhang Yu,
Zhao Yongchao,
Chen Zhongtian,
Cao Zhibo,
Zhao Ting,
Zhao Guo,
Hsieh Chung-Ching,
Chiu Chung-Yi
Publication year - 2019
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1002/sdtp.13646
Subject(s) - mura , seal (emblem) , position (finance) , pi , environmental science , computer science , materials science , chemistry , optoelectronics , art , visual arts , finance , liquid crystal display , economics , biochemistry
In this article, we study how to improve the irregular Mura in the surrounding and corner of GOA (Gate Driver on Array) product in high temperature and high humidity HTHHO (60/90) environment, because of the influence of PI Halo area. This article illustrates that by adjusting the PI phase separation ,adjusting the PI drop position and adjustment of coating position of Seal ,which can reduce the influence of PI and improve the around mura. The experimental results show that increasing PPO (PI prebake oven) temperature can accelerate the separation of PI phase, allow PI to form faster and improve the around mura. By modifying the Pattern coated by PI, the PI is expanded and the around mura. can be improved. Adjusting Seal location also improves Mura around the site.