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82‐2: Invited Paper: Roll‐to‐Roll Processing of Polysilicon TFTs on Flexible Large Area Stainless Steel Substrates
Author(s) -
Chandra Aditi,
Kamath Arvind,
Bruner Scott,
Beck Patricia,
Fischer Peter
Publication year - 2019
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1002/sdtp.13142
Subject(s) - materials science , cmos , internet of things , key (lock) , process (computing) , scaling , electrical engineering , polysilicon depletion effect , engineering physics , optoelectronics , engineering , computer science , transistor , embedded system , geometry , computer security , mathematics , operating system , gate oxide , voltage
Roll‐to‐roll (R2R) production of polysilicon CMOS TFTs on steel substrates for electronic devices allows for low‐cost and high‐volume manufacturing, enabling the Internet of Things (IOT). R2R process capabilities are demonstrated along with key equipment considerations and de‐risking approaches for scaling from a sheet‐based to roll‐based process.