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77‐4: Large Form Birefringence Realized by Dielectric Subwavelength Grating
Author(s) -
Quan Dunhang,
Jia Hao,
Li Weihao,
Cheng Xing,
Kwok Hoi-Sing
Publication year - 2019
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1002/sdtp.13123
Subject(s) - birefringence , materials science , grating , photolithography , refractive index , dielectric , optics , electron beam lithography , lithography , etching (microfabrication) , optoelectronics , substrate (aquarium) , resist , nanotechnology , layer (electronics) , physics , oceanography , geology
We present a detailed investigation of form birefringence realized by subwavelength grating based on high refractive index dielectric materials, e.g. titanium dioxide. The anticipated degree of birefringence is evaluated using Finite‐Difference Time‐Domain simulation of designed optical structure and in good accordance with the theoretical prediction. The designed subwavelength grating was fabricated using electron beam lithography and subsequent ICP dry etching technique on fused silica substrate. The artificial grating was then characterized under SEM and AFM, and a large birefringence 0.33 was obtained which can be furtherly improved with deposition process optimization.