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55‐2: Essential Mask Quality for High‐End Resolution Displays
Author(s) -
Kim Myung-Yong,
Choi Ji-Hoon,
Hur Ik-Boum,
Choi Sang-Soo,
Wahlsten Mikael,
Eklund Robert,
Park Young-Jin
Publication year - 2019
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1002/sdtp.13033
Subject(s) - photomask , high resolution , computer science , resolution (logic) , optical proximity correction , flat panel , process (computing) , materials science , nanotechnology , artificial intelligence , computer graphics (images) , resist , operating system , remote sensing , layer (electronics) , geology
This paper proposes a best practice to produce the photomasks with the state‐of‐the‐art quality, suitable for high resolution panel patterning. In order to extend the panel patterning process capability, high CD performance (Resolution, CD MTT and CD Uniformity) of photomask is essential and RET(Resolution Enhancement Technology) such as PSM, OPC and OAI will be prominent technology for mask business. PSM and OPC technology on RET will be new challenges for future high resolution panel. These challenges require new generation photomask writer, PSM manufacturing capability.