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26‐4: Late‐News Paper: Development of Positive‐type Photoresists Based on Polyorganosilsesquioxanes for the Pixel Defining Layer (PDL) in OLED Structures
Author(s) -
Jang Seunghyun,
Yoo Kwon Yil,
Ahn Jungmin,
Oh Chunrim
Publication year - 2019
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1002/sdtp.12933
Subject(s) - photoresist , oled , materials science , transmittance , thermal stability , silicone , layer (electronics) , optoelectronics , silicone resin , composite material , chemical engineering , coating , engineering
Silicone‐based positive‐type photoresists for the pixel defining layer (PDL) in OLED Structures have been developed. Silicone binder based on polyorganosilsesquioxane resin for the PDL has been synthesized by using a well‐known sol‐gel reaction. Also, photoresist characteristics based on silicone resin such as film retention rate, patterning profile, thermal stability, out‐gas, and transmittance have been investigated. In particular, thermal stability at high temperature (400°C), transmittance at 400 nm, and out‐gas properties were highly effective for the PDL application in OLED devices.