Premium
25‐2: Enabling MOCVD Technology for Micro LED High Volume Manufacturing
Author(s) -
Boyd Adam R.,
Beckers Arthur,
Eickelkamp Martin,
Alam Assadulla,
Heuken Michael
Publication year - 2019
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1002/sdtp.12926
Subject(s) - metalorganic vapour phase epitaxy , wafer , materials science , epitaxy , optoelectronics , light emitting diode , technology development , volume (thermodynamics) , nanotechnology , engineering , manufacturing engineering , physics , layer (electronics) , quantum mechanics
Epitaxy wafers are key to the technology development of Micro LED displays. As Micro LED chips are extremely small, the quality of epitaxy wafers including wavelength uniformity and low defect becomes crucial for further production process. We present progress on improvements to MOCVD technology of blue and red Micro LEDs based on Planetary Reactor ® technology to meet the new challenging wavelength and defect requirements.