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P‐6.5: Advanced Black Matrix Photoresist for Next Generation Color Filters
Author(s) -
Cai-Ping Luo,
Lin Wen-Fu,
Hsu Ming-Ann
Publication year - 2018
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1002/sdtp.12796
Subject(s) - photoresist , materials science , color gel , matrix (chemical analysis) , optoelectronics , high energy , optics , nanotechnology , composite material , physics , engineering physics , layer (electronics) , thin film transistor
A new black matrix photoresist was formulated to achieve high Optical Density (OD 4.0∼4.2/um), high resolution ((line width ≤5μm), high surface resistance (> 1 × 10 14 Ω / □), and high taper angle (> 70 °) performance. Extremely low exposure dose energy (<50mJ/cm2) also enables high throughput for volume manufacturing large area color filters. This new black photoresist has high potential to be used for 8K UHDTV and related applications.