Premium
P‐6.4: Black photoresist for flexible film with broad taper angle, high OD and very high electric resistivity
Author(s) -
Igawa Akihiko,
Lin Chia-Hui,
Hsu Ming-Ann
Publication year - 2018
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1002/sdtp.12795
Subject(s) - photoresist , electrical resistivity and conductivity , materials science , flexibility (engineering) , optoelectronics , electric field , high resistance , composite material , optics , electrical engineering , engineering , layer (electronics) , physics , agronomy , statistics , mathematics , quantum mechanics , biology
This paper introduces black photoresist specially designed for making black layers on flexible film. Flexibility, broad tapered profile, high optical density (OD) and high electric resistance are achieved. The flexibility is suitable for film type devices and the high electric resistivity is likely suitable for black matrix (BM) and micro light emitted diode (LED).