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31.1: Invited Paper: Monochromatic Active Matrix Micro‐LED Micro‐Displays with >5,000 dpi Pixel Density Fabricated using Monolithic Hybrid Integration Process
Author(s) -
Zhang Lei,
Ou Fang,
Chong Wing Cheung,
Chen Yijing,
Zhu Yuankun,
Li Qiming
Publication year - 2018
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1002/sdtp.12718
Subject(s) - active matrix , wafer , materials science , monochromatic color , optoelectronics , brightness , pixel , footprint , nanotechnology , optics , thin film transistor , physics , paleontology , layer (electronics) , biology
Wafer‐scale epi‐transfer process has been developed for monolithic hybrid integration of Si‐based IC and micro‐LED arrays. Monochromatic red, green, and blue Active‐Matrix micro‐LED (AMmLED) micro‐displays with a resolution of 5000+ PPI were demonstrated for the first time by JBD using this wafer‐scale monolithic hybrid integration technology, which shows feasibility and advantages for low cost mass productions. The brightness of the demonstrated AMμLED micro‐display (green) well exceeds 5x105cd/m2, representing an improvement of over 500‐times compared to the existing self‐emissive micro‐displays. The ultra‐high pixel resolution, high brightness and contrast ratio, low power consumption, and small footprint makes AMμLED micro‐displays highly desirable for various wearable electronics and AR applications.