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29‐2: Advanced Photo‐alignment Material for Both Photo and Rubbing‐alignment Methods
Author(s) -
Park Hyun Jin,
Lee Jong Hwae,
Lee Su-Bin,
Kwak Chang-Hwan,
Park Seung Ryull,
Lee Joun-Ho,
Jun Myung-Chul,
Kang In-Byeong
Publication year - 2018
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1002/sdtp.12575
Subject(s) - rubbing , materials science , optics , computer science , composite material , physics
We propose the advanced photo‐alignment material with improved film hardness suitable for both photo‐alignment and rubbing‐alignment method. Using advanced photo‐alignment material, excellent performance can be obtained using not only photo‐alignment but also rubbing alignment.