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P‐191: Testing and Preparation of White Matrix Resist for OGS Touch Panel
Author(s) -
Du Zhi,
Yang Hong,
Shao Xibin,
Guo Zongjie,
Zhang Ming,
Chen Qicheng,
Ding Xianlin,
Chen Cui,
Zeng Ting,
Yin Liuyue,
Hu Haifeng
Publication year - 2018
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1002/sdtp.12441
Subject(s) - resist , photoresist , materials science , chromaticity , substrate (aquarium) , layer (electronics) , optics , coating , matrix (chemical analysis) , composite material , oceanography , physics , geology
In this paper, three kinds of WM (white matrix resist) were testing. First, WM with the same thickness were prepared at different exposure dose, the influence of the exposure dose on profile angle was analyzed, exposure dose can effectively reduce profile angle. And the WM of 11, 13 and 15um were prepared, it was found that the larger the thickness, the greater the profile angle. Aiming at the chromaticity of the white touch screen, the influence of different process temperature, thickness and glass substrate on the chromaticityof the white touch screen is analyzed. At the same time, the problem of residual BM (black matrix resist) in the hole of the camera hole and photoresist in the climbing area during the process of making the touch screen was discussed. The solution of filling the OC (Over Coating: transparent organic materials) buffer layer and enhancing the Photoresist VCD (Vacuum Chamber Dry)