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P‐75: Advanced Halftone Photolithography Using Four‐Mask Process Architecture for G8.6 TFT‐LCDs
Author(s) -
Cho An-Thung,
Hsu James,
Zhou Jeff,
Hong Jinn,
Yang Feng-yun,
Luo Yan-mei,
Tian Yi-qun,
Lei Dan,
Liu Zhen,
Mo Qiong-hua,
Liu Kai-jun,
Ge Bang-tong,
Long Feng-xiang,
Fu Ting-ting,
Li Min,
Chen Wade,
Lu York
Publication year - 2018
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1002/sdtp.12240
Subject(s) - photoresist , halftone , photolithography , thin film transistor , tone (literature) , computer science , materials science , process (computing) , luminance , computer hardware , optoelectronics , nanotechnology , artificial intelligence , layer (electronics) , art , pixel , literature , operating system
Advanced four‐mask process a‐Si TFT array manufacturing method and good TFT stability is presented in this paper. We used an optimum half‐tone mask transmittance and half‐tone photoresist for the four‐mask process architecture. Data line open and photoresist peeling issues occurred in G8.6 TFT‐LCDs and solutions will be shown.