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68‐3: Study on Relation between Fluorescent Dye Combination and Process Temperature as Photoresist
Author(s) -
Lee Seungbeom,
Kim Sooin,
Kim Wonrae,
Kim Younghoon,
Kwak Musun,
Lee Jounho,
Jun Mike,
Kang Inbyeong
Publication year - 2018
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1002/sdtp.12234
Subject(s) - photoresist , fluorescence , optoelectronics , materials science , color gel , process (computing) , fluorescent lamp , layer (electronics) , filter (signal processing) , diode , oled , intensity (physics) , fluorescent light , photochemistry , optics , nanotechnology , chemistry , computer science , computer vision , physics , operating system , thin film transistor
Suggested additional layer of fluorescent dye combination and proper process temperature condition as photoresist (PR) optimize the display between white organic light emitting diode (WOLED) and color filter (CF). As a result, this application have an effective way to increase color coverage and shows that the PL intensity area at the post‐bake condition below 200℃ is 13% higher than above 200℃.