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P‐77: Area‐Selective Atomic Layer Deposition Using Inkjet‐printed Fluorocarbon Patterns as Mask Layers
Author(s) -
Cho Young-In,
Yu Jun-Ho,
Yoon Dai Geon,
Park Jin-Goo,
Choi Kyung Hyun,
Lee Sang-Ho
Publication year - 2018
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1002/sdtp.12232
Subject(s) - atomic layer deposition , fluorocarbon , substrate (aquarium) , materials science , layer (electronics) , deposition (geology) , nucleation , nanotechnology , inkjet printing , optoelectronics , chemistry , inkwell , composite material , organic chemistry , paleontology , oceanography , sediment , geology , biology
This study introduces area‐selective atomic layer deposition (AS‐ALD) using fluorocarbon (FC) mask patterns with low surface energy. FC mask patterns were formed on a glass substrate by inkjet printing method. The surface energy of the printed FC thin film was 13.04 dyne/cm enough low to inhibit nucleation and growth during ALD. 10 µm wide Al 2 O 3 patterns were selectively formed by removal of FC mask patterns using oxygen plasma after Al 2 O 3 ALD processes.
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